Nanoscale Imaging, Fabrication and Materials Modification Using Ion Beams
Andrew BETTIOL, National University of Singapore, Singapore
Jeroen VAN KAN, National University of Singapore, Singapore
Robert G ELLIMAN, Australian National University, Australia
Ioannis RAPTIS, National Centre of Scientific Research Demokritos', Greece
Andrew BETTIOL, National University of Singapore, Singapore Email: firstname.lastname@example.org Tel: +65 6516 4138 Fax: +65 6777 6126 Mailing Address: Department of Physics, National University of Singapore, 2 Science Dr 3 Singapore 117542
Scope of Symposium
Ion beams are currently used in a variety of research fields including materials science, biology and medicine, optics and photonics, and semiconductor physics. Recent advances in ion beam technologies have resulted in new ways of using ion beams for both making nanostructures and devices, and for imaging at the nano level. In this symposium we aim to bring together scientists who are interested in understanding ion-solid interaction processes and how they can be applied to nanoscience and nanotechnology. The symposium will cover theoretical, experimental and technical aspects of ion beams including ion implantation and materials modification, proton beam writing, ion beam lithography, ion beam nanoimaging and ion beam analysis.
Fifth Proton beam Writing workshop: This symposium will also include the 5th International Workshop on Proton Beam Writing.
Proceedings The proceedings for Symposium BB: Nanoscale Imaging, Fabrication and Materials Modification using Ion Beams, at ICMAT2011 will be published as a special issue in the journal Microelectronic Engineering. Papers that are submitted must be presented as either an oral or poster presentation by one of the authors during the conference. The manuscript length should be no more than 4 journal pages for contributed papers, and up to 6 journal pages for invited presentations. All manuscripts will be submitted using the journal online system and reviewed according to the usual standard employed by the journal. The submission website for the journal is located at: http://ees.elsevier.com/mee/default.asp To ensure that all manuscripts are correctly identified for inclusion into the ICMAT special issue, it is important that authors select Special Issue: ICMAT 2011 when they reach the "Article Type" step in the submission process. The deadline for submitting manuscripts is July 15th 2011 (2 weeks after the conference).
We wish to thank the Air Force Office of Scientific Research, Asian Office of Aerospace Research and Development for their contribution to the success of this conference,
Paul ALKEMADE, Delft University of Technology,
John BAGLIN, IBM Almaden Research Center,
Feng CHEN, Shandong University,
Pickard DANIEL S, National University of Singapore,
Jaques GIERAK, Centre National de la Recherche Scientifique,