Industrial Symposium I
Nanoimprint Lithography Industrial Symposium


  • Hong Yee LOW, Institute of Materials Research and Engineering, Singapore


  • Jaslyn LAW
    Institute of Materials Research and Engineering, Singapore
    3 Research Link, Singapore 117602
    Tel: (65) 68727746, Fax: (65) 68720785

Scope of Symposium

The Nanoimprint Lithography (NIL) Industrial Symposium is sponsored by Exploit Technologies Pte Ltd (ETPL), the strategic marketing and commercialization arm of A*STAR, and organized by The Institute of Materials Research and Engineering (IMRE). This half-day industrial symposium aims to update the recent developments, markets and technology in NIL. It also serves as a platform for industrial partners, venture capitalists, companies interested in NIL applications to acquire an understanding of the landscape and explore business opportunities/potential partnerships and expand industrial utilization of NIL technologies.

Registration for Industrial Symposium 1
Thursday, 2 July 2009 (1:00 to 5:30 pm)
Registration Rate: SGD 80 per person

Online registration closed, please register onsite (Level 3, Room 302) on 2 July 2009

Registrants of ICMAT & IUMRS-ICA 2009 are entitled to attend the industrial symposium as part of their registration entitlement.

Technical Programme

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